Atomic Layer Deposition & Glovebox
August 11, 2025 05:08 PM
4” chuck, multi-precursor, RT–320°C chamber, 180°C precursors
Equipment Images:
Manufacturer / Vendor:
Anric
Model:
AT410
Building:
Room Number:
0002
Functionality:
Applications:
ALD thin-film technique using alternate gaseous precursor exposure
Custodian Department / Unit:
Point of Contact Name:
Dr. Maduraiveeran Govindhan
Point of Contact Email:
Status:
